Description |
xxxi, 558 p. : ill. (some col.) |
Bibliography |
Includes bibliographical references and index. |
Contents |
pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions. |
Reproduction |
Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries. |
Subject |
Dielectrics.
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Metal oxide semiconductors, Complementary.
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Genre/Form |
Electronic books.
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Added Author |
He, Gang.
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Sun, Zhaoqi.
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ProQuest (Firm)
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ISBN |
9783527330324 |
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9783527646371 (electronic bk.) |
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