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Title Handbook of VLSI microlithography : principles, technology, and applications / edited by John N. Helbert.

Imprint Park Ridge, N.J. : Noyes Publications ; Norwich, N.Y. : William Andrew Pub., 2001.

Copies

Location Call No. OPAC Message Status
 Axe Books 24x7 Engineering E-Book  Electronic Book    ---  Available
Edition 2nd ed.
Description 1 online resource (xxi, 1001 pages) : illustrations.
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
Series Materials science and process technology series. Electronic materials and process technology
Materials science and process technology series. Electronic materials and process technology.
Summary This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and pattern feature dimension control. The book's explanation of resist and resist process equipment technology describes the relationship between the resist process and equipment parameters. The basics of resist technology are also covered - including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.
Bibliography Includes bibliographical references and index.
Note Print version record.
Contents Issues and Trends Affecting Lithography Tool Selection Strategy -- Resist Technology: Design, Processing and Applications -- Lithography Process Monitoring and Defect Detection -- Techniques and Tools for Photo Metrology -- Techniques and Tools for Optical Lithography -- Microlithography Tool Automation -- Electron Beam ULSI Applications -- Rational Vibration and Structural Dynamics for Lithographic Tool Installations -- Applications of Ion Microbeam Lithography and Direct Processing -- X-Ray Lithography.
Access Use copy Restrictions unspecified star MiAaHDL
Reproduction Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
System Details Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
Processing Action digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL
Subject Integrated circuits -- Very large scale integration.
Microlithography.
TECHNOLOGY & ENGINEERING -- Electronics -- Circuits -- General.
Integrated circuits -- Very large scale integration. (OCoLC)fst00975602
Microlithography. (OCoLC)fst01019883
Genre/Form Electronic books.
Electronic books.
Added Author Helbert, John N.
Other Form: Print version: Handbook of VLSI microlithography. 2nd ed. Park Ridge, N.J. : Noyes Publications ; Norwich, N.Y. : William Andrew Pub., 2001 0815514441 (DLC) 00028173 (OCoLC)43591143
ISBN 1591242754 (electronic bk.)
9781591242758 (electronic bk.)
9780815517801 (electronic bk.)
0815517807 (electronic bk.)
9780815514442
0815514441
Standard No. AU@ 000025337210
DEBBG BV039832761
DEBBG BV042315371
DEBSZ 338255346
DEBSZ 405321708
NZ1 10240385
NZ1 15909299
GBVCP 878883010
CHVBK 519211103
CHNEW 001004469

 
    
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