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Conference Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation (1995 : Strasbourg, France)

Title Ion Beam Processing of Materials and Deposition Processes of Protective Coatings : Proceedings of Symposium C, Symposium J and Symposium H of the 1995 E-Mrs Spring Conference, Strasbourg, France, May 22-26, 1995 / edited by P.L.F. Hemment [and others].

Imprint Oxford : Elsevier Science, 1996.

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Location Call No. OPAC Message Status
 Axe Elsevier ScienceDirect Ebook  Electronic Book    ---  Available
Description 1 online resource (630 pages)
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
Series European Materials Research Society Symposia Proceedings
European Materials Research Society symposia proceedings.
Note Print version record.
Contents Front Cover; Ion Beam Processing of materials and Deposition Processes of Protective Coatings; Copyright Page; Part I: Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation; E-MRS'95 Symposium J Preface; E-MRS'95 Symposium C Preface; Table of Contents; Section I. Fundamental Aspects of Cluster Collisions; Chapter 1. Molecule and cluster bombardment: energy loss, trajectories, and collision cascades; 1. Introduction; 2. Stopping and straggling; 3. Trajectory correlations; 4. Kinematics of collision cascades; 5. Concluding remarks; Acknowledgement; References.
Chapter 2. Nonlinear transmission sputtering1. Introduction; 2. Correlated transmission sputtering; 3. Pair correlations; 4. Multiple scattering; 5. Discussion; Acknowledgement; References; Chapter 3. Molecular dynamics study of shock wave generation by cluster impact on solid targets; 1. Introduction; 2. The model; 3. Results and discussions; 4. Summary; References; Chapter 4. Track formation in metals by electronic processes using atomic and cluster ions; References; Chapter 5. Atomic and cluster ion bombardment in the electronic stopping power regime: A thermal spike description.
1. Introduction2. Physical basis; 3. Results and discussion; 4. Conclusion; References; Section II. Production, Acceleration and Diagnostics of High Intensity Beams and of Molecular Ions a; Chapter 6. Production, acceleration and diagnostics of high intensity beams; 1. Introduction; 2. Methods of ion production from solids; 3. High current ion sources; 4. Extraction and ion beam transport; 5. Diagnosis of high current ion beams; References; Chapter 7. Production, acceleration and diagnostics of molecular ions and ionized clusters; 1. Introduction.
2. Cluster ion beams produced with a tandem accelerator3. The ORION-TANDEM project; 4. A macromolecular accelerator; 5. Conclusion; Acknowledgement; References; Section III. Surface Phenomena, Photon, Electron or Ion Emission, Sputtering; Chapter 8. Hyperthermal chemistry and cluster collisions; 1. Introduction; 2. Experimental; 3. Gas phase collisions; 4. C+60surface collisions; 5. Conclusion; Acknowledgements; References; Chapter 9. A plasma desorption mass spectrometry study of cluster ion formation from group IIA nitrates; 1· Introduction; 2. Experimental; 3. Results and discussion.
4. ConclusionsAcknowledgments; References; Chapter 10. Sputtering of large size clusters from solids bombarded by high energy cluster ions and fullerenes; 1. Introduction; 2. Experimental; 3. Results and discussion; 4. Conclusion; Acknowledgements; References; Chapter 11. Acceleration of clusters, collision induced charge exchange at MeV energies and applications for materials science; 1. Introduction; 2. Production of negatively charged cluster ions; 3. The stripping process; 4. Detection and identification of the high energy clusters; 5. Measurements and results; 6. Conclusion; References.
Note Chapter 12. The use of coincidence counting mass spectrometry to study the emission and metastable dissociation of cluster ions.
Summary Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation. Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric c.
Subject Ion plating -- Congresses.
Protective coatings -- Congresses.
Ion bombardment -- Congresses.
Ion implantation -- Congresses.
Complex ions -- Congresses.
Dépôt ionique -- Congrès.
Revêtements protecteurs -- Congrès.
Bombardement ionique -- Congrès.
Ions -- Implantation -- Congrès.
Ions complexes -- Congrès.
SCIENCE -- Physics -- Condensed Matter.
Complex ions
Ion bombardment
Ion implantation
Ion plating
Protective coatings
Genre/Form Congress
proceedings (reports)
Conference papers and proceedings
Conference papers and proceedings.
Actes de congrès.
Added Author Hemment, P. L. F. (Peter L. F.)
Other Form: Print version: Hemment, P.L.F. Ion Beam Processing of Materials and Deposition Processes of Protective Coatings : Proceedings of Symposium C, Symposium J and Symposium H of the 1995 E-Mrs Spring Conference, Strasbourg, France, May 22-26, 1995. Oxford : Elsevier Science, ©1996 9780444824103
ISBN 9780444596314 (electronic bk.)
0444596313 (electronic bk.)
Standard No. AU@ 000050986355
DEBBG BV042310863
DEBSZ 43134566X

 
    
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