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Author Zalevsky, Zeev.

Title New approaches to image processing based failure analysis of nano-scale ULSI devices / Zeev Zalevsky, Pavel Livshits, Eran Gur.

Imprint Oxford : William Andrew, 2014.

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Location Call No. OPAC Message Status
 Axe Elsevier ScienceDirect Ebook  Electronic Book    ---  Available
Description 1 online resource (179 pages)
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
Series Micro and Nano Technologies
Micro & nano technologies.
Summary New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise.
Note Print version record.
Bibliography Includes bibliographical references.
Contents Front Cover; New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices; Copyright Page; Contents; Preface; 1 Introduction; 1.1 Basics of Image Processing; 1.1.1 Introduction to Image Processing; 1.1.2 Histograms; 1.1.3 Spatial Filtering; 1.1.4 Fourier Analysis; 1.2 The Problems of Shrinking Feature Size in ULSI Development and Failure Analysis; 1.3 High Resolution Imaging of Structures; 1.4 Fabrication Techniques in ULSI Industry; References; 2 New Image Processing Methods for Advanced Metallization in Micro- and Nano-Electronics
2.1 Characteristics of Metal Ultrathin Films' Microstructures2.2 Increased Productivity by Obviating Steps of Selection of Measurement Conditions; 2.2.1 Introduction; 2.2.2 The Novel Algorithm; 2.3 Demonstration of Method Capabilities; References; 3 New Super Resolving Techniques and Methods for Microelectronics; 3.1 The basics of super resolution; 3.1.1 Introduction; 3.1.2 Fundamental limits to resolution improvement; 3.1.3 Diffractive optical superresolution; 3.1.4 Geometrical superresolution; 3.1.4.1 Sampling density; 3.1.4.2 Nonideal sampling; 3.1.4.3 Image sequence approaches
3.1.4.4 Approach involving physical components3.1.4.5 Digital processing methods; 3.1.5 Wigner Transform; 3.1.5.1 Wigner of sampled signals; 3.1.5.2 Wigner of microscanned signals; 3.1.5.3 Nonideal sampling; 3.1.5.4 Geometrical super resolution; 3.2 Super-Resolution Imaging for Improved Failure Analysis; 3.2.1 Resolution limit in failure analysis; 3.2.2 Super Resolving Algorithm; 3.2.3 Experimental Results; 3.3 Usage of Radon Transform for Improved Failure Analysis; 3.3.1 The Radon Transform theory; 3.3.2 Failure analysis based upon Radon transform; 3.3.3 The Algorithm
Language English.
Subject Integrated circuits -- Ultra large scale integration -- Testing.
Nanoelectronics.
Microelectronics.
Miniaturization
Nanoélectronique.
Microélectronique.
microelectronics.
TECHNOLOGY & ENGINEERING -- Mechanical.
Integrated circuits -- Ultra large scale integration -- Testing
Microelectronics
Nanoelectronics
Added Author Livshits, Pavel.
Gur, Eran.
Other Form: Print version: Zalevsky, Zeev. New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices. Burlington : Elsevier Science, ©2013 9780323241434
ISBN 9780323241434 (electronic bk.)
0323241433 (electronic bk.)
9780128000175 (electronic bk.)
0128000171 (electronic bk.)
Standard No. AU@ 000054755311
CHNEW 001011557
DEBBG BV042315207
DEBSZ 405352131
DEBSZ 431567093
NLGGC 370564227
NZ1 15341982

 
    
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