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C 13. 10 : 960- 13
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Pore characterization in low-k dielectric films using x-ray reflectivity x-ray porosimetry



[Gaithersburg, Md.] : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2004] 2004

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 Axe Federal Documents Online  C 13.10:960-13    ---  Available
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ElectronicResource GovDoc
 

Pore characterization in low-k dielectric films using x-ray reflectivity x-ray porosimetry



[Gaithersburg, Md.] : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2004] 2004

Rating:

Copies

Location Call No. OPAC Message Status
 Axe Federal Documents Online  C 13.10:960-13    ---  Available
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