| Description |
1 online resource (xv, 247 pages) : illustrations |
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text txt rdacontent |
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computer c rdamedia |
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online resource cr rdacarrier |
| Series |
Advances in imaging and electron physics ; v. 143 |
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Advances in imaging and electron physics ; v. 143.
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| Bibliography |
Includes bibliographical references (pages 219-235) and index. |
| Contents |
Introduction. -- Electron-beam-induced nanometer-scale deposition: a literature survey. -- The theory of EBID spatial resolution. -- The role of secondary electrons in EBID. -- Delocalization effects in EBID. |
| Summary |
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. |
| Note |
Print version record. |
| Language |
English. |
| Subject |
Nanotechnology.
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Molecular electronics.
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Électronique moléculaire.
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Nanotechnologie.
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TECHNOLOGY & ENGINEERING -- Nanotechnology & MEMS.
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Molecular electronics
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Nanotechnology
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| Added Author |
Cividjian, Natalia, 1967-
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Hagen, Cornelis W.
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| Other Form: |
Print version: Electron-beam-induced nanometer-scale deposition. Amsterdam ; Boston : Elsevier Academic Press, ©2006 0120147858 9780120147854 (OCoLC)71366341 |
| ISBN |
9780080465357 (electronic bk.) |
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0080465358 (electronic bk.) |
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0120147858 (electronic bk.) |
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9780120147854 (electronic bk.) |
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6610707480 (electronic bk.) |
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9786610707485 (electronic bk.) |
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1280707488 |
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9781280707483 |
| Standard No. |
AU@ 000056741329 |
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CHBIS 010355184 |
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CHVBK 329754335 |
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DEBSZ 405319029 |
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