| Edition |
2nd ed. |
| Description |
1 online resource (xxiv, 482 pages) : illustrations |
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text txt rdacontent |
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computer c rdamedia |
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online resource cr rdacarrier |
| Series |
Materials science and process technology series |
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Materials science and process technology series.
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| Summary |
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications. |
| Contents |
Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index. |
| Bibliography |
Includes bibliographical references and index. |
| Note |
Print version record. |
| Subject |
Chemical vapor deposition -- Handbooks, manuals, etc.
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Vapor-plating -- Handbooks, manuals, etc.
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Dépôt chimique en phase vapeur -- Guides, manuels, etc.
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Dépôt en phase vapeur -- Guides, manuels, etc.
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Chemical vapor deposition
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Vapor-plating
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| Genre/Form |
handbooks.
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manuals (instructional materials)
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Handbooks and manuals
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Handbooks and manuals.
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Guides et manuels.
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| Added Author |
Pierson, Hugh O.
Handbook of chemical vapor deposition (CVD)
|
| Spine Title |
Handbook of chemical vapor deposition |
| Other Form: |
Print version: Pierson, Hugh O. Handbook of chemical vapor depostion [i.e. deposition] (CVD). 2nd ed. Norwich, N.Y. : Noyes Publications/William Andrew Pub., ©1999 0815514328 9780815514329 (DLC) 99026065 (OCoLC)41090758 |
| ISBN |
9780815514329 |
|
0815514328 |
|
1591240301 (electronic bk.) |
|
9781591240303 (electronic bk.) |
| Standard No. |
AU@ 000061145671 |
|
CHNEW 001007805 |
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DEBBG BV042304519 |
|
DEBSZ 38013814X |
|
NZ1 15188517 |
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NZ1 16061344 |
|
