| Edition |
2nd ed. |
| Description |
1 online resource (xxviii, 629 pages) : illustrations. |
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text txt rdacontent |
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computer c rdamedia |
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online resource cr rdacarrier |
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data file rda |
| Series |
Materials science and process technology series. Electronic materials and process technology |
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Materials science and process technology series. Electronic materials and process technology.
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| Summary |
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials. |
| Bibliography |
Includes bibliographical references and index. |
| Note |
Print version record. |
| Contents |
Foreword: Gordon Moore -- Recent Changes in the Semiconductor Industry -- Deposition Technologies and Applications: Introduction and Overview -- Silicon Epitaxy by Chemical Vapor Deposition -- Chemical Vapor Deposition of Silicon Dioxide Films -- Metal Organic Chemical Vapor Deposition -- Feature Scale Modeling -- The Role of Metrology and Inspection to Semiconductor Processing -- Contamination Control, Defect Detection and Yield Enhancement in Gigabit Manufacturing -- Sputtering and Sputter Deposition -- Laser and Electron Beam Assisted Processing -- Molecular Beam Epitaxy: Equipment and Practice -- Ion Beam Deposition -- Chemical Mechanical Polishing -- Organic Dielectrics in Multilevel Metallization of Integrated Circuits -- Performance, Processing, and Lithography Trends -- Index. |
| Language |
English. |
| Subject |
Thin film devices -- Design and construction -- Handbooks, manuals, etc.
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Thin films -- Handbooks, manuals, etc.
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Chemical vapor deposition -- Handbooks, manuals, etc.
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Couches minces -- Guides, manuels, etc.
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Dépôt chimique en phase vapeur -- Guides, manuels, etc.
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TECHNOLOGY & ENGINEERING -- Electronics -- Solid State.
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TECHNOLOGY & ENGINEERING -- Electronics -- Semiconductors.
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Chemical vapor deposition
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Thin film devices -- Design and construction
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Thin films
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Filmes finos (equipamentos)
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| Genre/Form |
Electronic book.
|
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Handbook |
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handbooks.
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Handbooks and manuals
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Handbooks and manuals.
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Guides et manuels.
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| Added Author |
Seshan, Krishna.
|
| Other Form: |
Print version: Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications. Norwich, N.Y. : Noyes Publications/William Andrew Pub., 2002 0815514425 (DLC) 2001135178 (OCoLC)42960492 |
| ISBN |
1591241936 (electronic bk.) |
|
9781591241935 (electronic bk.) |
|
9780815517788 (electronic bk.) |
|
0815517785 (electronic bk.) |
|
9780815517764 (electronic bk.) |
|
0815517769 (electronic bk.) |
|
9780815514428 |
|
0815514425 |
|
0429076746 |
|
9780429076749 |
|
1482269686 |
|
9781482269680 |
|
1282253190 |
|
9781282253193 |
|
9786612253195 |
|
6612253193 |
|
9786612253188 |
|
6612253185 |
| Standard No. |
AU@ 000025337205 |
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AU@ 000027051712 |
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DEBBG BV039828143 |
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DEBBG BV042304205 |
|
DEBSZ 405321686 |
|
NZ1 10240380 |
|
NZ1 15593200 |
|
CHNEW 001004468 |
|
