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Title Advances in CMP/polishing technologies for the manufacture of electronic devices / edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.

Imprint Oxford : William Andrew, 2012.

Copies

Location Call No. OPAC Message Status
 Axe Elsevier ScienceDirect Ebook  Electronic Book    ---  Available
Edition 1st ed.
Description 1 online resource (xii, 317 pages)
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
Summary CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R & D accessible to the wider engineering community.
Note Includes index.
Subject Electrolytic polishing.
Grinding and polishing.
Polissage électrolytique.
electropolishing.
Electrolytic polishing
Grinding and polishing
Added Author Doi, Toshiro. Editor.
Marinescu, Ioan D. Editor.
Kurokawa, Syuhei. Editor.
ISBN 9781437778595
1437778593
Standard No. AU@ 000048545434
DEBBG BV042314926
DEBSZ 407380787
DEBSZ 434140635
NZ1 15189811
NZ1 15622121
CHNEW 001010355

 
    
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