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Title Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates [electronic resource] : annual technical status report, 11 March 1998-11 March 1999 / S.J. Jones ... [et al.].

Imprint

Golden, Colo. : National Renewable Energy Laboratory, [1999]

Connect to
Connect to https://www.nrel.gov/docs/fy99osti/26795.pdf

Copies

Location	Call No.	OPAC Message	Status
Axe Federal Documents Online	E 9.18:NREL/SR-520-26795	---	Available

Description	29 p. : digital, PDF file
Series	NREL/SR ; 520-26795
System Details	Mode of access: Internet from the NREL web site.
Note	Title from title screen (viewed June 20, 2008).
	"September 1999."
	"Subcontractor report."
Subject	Photovoltaic cells -- Research.
	Solar cells.
	Thin films.
	Plasma-enhanced chemical vapor deposition.
Added Author	Jones, S. J.
	National Renewable Energy Laboratory (U.S.)
Added Title	Use of very high frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates
Other Form:	Use of very-high-frequency plasma to prepare a-Si:H-based triple-junction solar cells at high deposition rates 29 p. (OCoLC)44490445
Gpo Item No.	0430-P-05 (online)
Sudoc No.	E 9.18:NREL/SR-520-26795